UVE - M565F Collimated Exposure System

Image of UVE - M565F Collimated Exposure System


C Sun are leading manufacturers of both drawer type and automatic imaging systems for printed circuit substrates for primary imaging, solder mask, and specialty applications.

The UVE-M565F Exposure system has been developed for fine line imaging of substrates up to 24” x 30”. Using either 2 Camera or 4 Camera registration system,  short arc Hg – Xe Lamp with optical collimation, and glass/glass registration, the UVE-M565F is suitable for imaging to 50m (.002”) lines and spaces.

Maximum Substrate Size : 24” x 30”
Lamp Type : 5Kw Short Arc Hg-Xe Lamp
Exposure : Double Sided, Dual Frame
Collimation : < 2o
Exposure Uniformity : 90%+
Intensity : Above Glass - > 20Mw/cm2
Cooling : Air Cooled
Vision Alignment System : 2 camera Standard, 4 Camera Optional
Alignment Precision : < +/- 25m (.001”) – “Best Fit”
System Control : Precision U.V. Integrators, Touch Screen Control

Request More Information